Fused-Silica-Glass
高电阻低热膨胀系数

熔融石英玻璃

熔融石英玻璃因其优异的物理化学性能,被广泛应用于半导体、光学和科学研究等高科技领域。它由高纯度二氧化硅(SiO₂,>99.9%)的非晶态材料构成,不含其他氧化物,避免了杂质的产生。

加工能力

我们能够以极高的精度加工熔融石英的复杂形状、曲面和轻质结构。此外,我们还提供抛光、薄膜涂层和喷砂/粗糙化等表面处理工艺,以满足半导体和其他高精度应用的需求。

Fused Silica Glass Machining
公差 ±1um
平面度 1 µm (Ø300 mm)
平行度 1 µm
粗糙度 Ra 0.002 µm
最小孔径 0.1mm
最大尺寸 Φ400mm

优势

  • 高机械强度
  • 高纯度(>99.9% SiO₂)
  • 极低的热膨胀系数
  • 高电阻率
  • 优异的耐化学腐蚀性
  • 高透光率

性能参数

下表列出了我们标准熔融石英材料的典型性能参数。这些数值来源于内部测试和生产批次的统计分析,仅供设计参考。实际性能可能因加工条件和批次差异而略有不同。

材料性能 单位 熔融石英
密度 g/cm³ 2.2
抗弯强度 MPa 80
抗压强度 MPa 1100
弹性模量 GPa 220
泊松比 0.17
杨氏模量 GPa 72
热学性能 单位 熔融石英
热导率 W/m·K 1.38
熔点 °C 1730
最高工作温度 °C 1200
线膨胀系数 10⁻⁶/K 0.55
电学性能 单位 熔融石英
介电常数 1 MHz 3.75
击穿电压 V/cm 400
介电损耗 1 MHz <
电阻率 Ω·cm > 10¹⁸

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Fused Silica Glass Applications

应用

  • 紫外透镜、激光窗口、反射器基板
  • 红外/紫外窗口、高速飞机窗口
  • 石英比色皿、激光腔透镜
  • 光谱仪和色谱仪的光路组件
  • 微结构器件、光阱结构、真空腔窗口
  • 干涉仪、陀螺仪基板
  • 高温气体传感器窗口

案例

Five-axis machining of fused silica glass

FAQS

What Is JGS1 Fused Silica?

JGS1 Fused Silica is a UV-grade optical quartz material characterized by high purity, excellent UV transmittance (185–2500 nm), and superior thermal stability. It is one of the three grades defined by China’s GB/T 31447.1 standard for optical fused silica (JGS1, JGS2, JGS3).JGS1: UV-grade, best for deep-UV and precision optics.、JGS2: Standard optical grade for visible–IR.、JGS3: IR-grade, ideal for thermal or infrared applications. Click to view our full guide to JGS1 Fused Silica

Our Fused Quartz Parts Machining Service
High-Precision Capabilities:
Complex shapes: tolerances up to ±1um
Cylindrical/shaft components: tolerances up to ±1um
Surface flatness: up to 1um
Optical flatness: up to 1/20λ (depending on wavelength)
Micro-holes: diameters as small as 0.1 mm (tolerance ±0.01 mm)
Surface roughness: Ra 0.01 μm for structural parts, Ra 0.002 μm for optical components
Surface Treatment: Polishing, optical coating
How Does Fused Silica Compare with Zerodur and ULE Glass?

Fused Silica is one of the most commonly used low-CTE glass materials. Compared with Zerodur from SCHOTT and ULE Glass from Corning, fused silica has a slightly higher thermal expansion coefficient, but it offers excellent optical transmission, good thermal stability, and lower cost.

Because of this balance of performance and affordability, fused silica is widely used in optics, lasers, and semiconductor equipment.

What Is the Difference Between Fused Silica Glass and Sapphire Glass?
Both materials excel in optics and high-precision applications. Sapphire is single-crystal alumina, while fused silica is high-purity silica glass. Sapphire glass has higher hardness and stronger scratch resistance, while fused silica glass has a lower coefficient of thermal expansion than sapphire, resulting in better dimensional stability. In terms of optical performance, fused silica is superior for ultraviolet applications, while sapphire is better suited for applications requiring durability and hardness.
Do You Support Thin Film Processing for Fused Silica Glass?
Yes, we support thin film processing for Fused Silica components. In addition, we can provide several surface treatments based on customer requirements, including:Sandblasting / Surface Roughening、Precision Polishing、Thin Film Coating
These processes can help improve optical performance, surface properties, or functionality for various optical and semiconductor applications.

Macor is a machinable glass-ceramic made from fluorophlogopite mica crystals embedded in a borosilicate glass matrix. This composition gives it a rare
combination of metal-like machinability, excellent electrical insulation, low thermal conductivity, and stability up to 1000°C (no load) while maintaining very tight tolerances.